Specific Process Knowledge/Bonding/Wafer Bonder 02: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Bonding/Wafer_Bonder_02 click here]''' | '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Bonding/Wafer_Bonder_02 click here]''' | ||
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=Wafer Bonder 02= | |||
[[Image:wafer bonder2.jpg|300x300px|thumb|Wafer Bonder 02: Positioned in cleanroom E-4]] | [[Image:wafer bonder2.jpg|300x300px|thumb|Wafer Bonder 02: Positioned in cleanroom E-4]] | ||
The Wafer bonder 02 is a system for bonding. 3 different types of [[Specific Process Knowledge/Bonding|bonding]] can be done: Anodic, Eutectic and Fusion. Furthermore it is possible to align the wafers one wishes to bond. It is also possible to process and align pieces. | The Wafer bonder 02 is a system for bonding. 3 different types of [[Specific Process Knowledge/Bonding|bonding]] can be done: Anodic, Eutectic and Fusion. Furthermore it is possible to align the wafers one wishes to bond. It is also possible to process and align pieces. | ||
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==Process information== | ==Process information== | ||
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*[[Specific Process Knowledge/Bonding/Fusion bonding|Fusion bonding]] | *[[Specific Process Knowledge/Bonding/Fusion bonding|Fusion bonding]] | ||
*[[Specific Process Knowledge/Bonding/Anodic bonding|Anodic bonding]] | *[[Specific Process Knowledge/Bonding/Anodic bonding|Anodic bonding]] | ||
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==Overview of the performance of the Wafer Bonder 02 and some process related parameters== | ==Overview of the performance of the Wafer Bonder 02 and some process related parameters== | ||