Specific Process Knowledge/Wafer and sample drying/Critical Point Dryer: Difference between revisions
mNo edit summary |
|||
| (5 intermediate revisions by 2 users not shown) | |||
| Line 1: | Line 1: | ||
{{cc-nanolab}} | |||
'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.''' | |||
'''Feedback to this page''': '''[mailto:pvd@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Wafer_and_sample_drying/Critical_Point_Dryer&action=edit click here]''' | '''Feedback to this page''': '''[mailto:pvd@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Wafer_and_sample_drying/Critical_Point_Dryer&action=edit click here]''' | ||
| Line 15: | Line 19: | ||
In the critical point dryer, samples are dried in | In the critical point dryer, samples are dried in supercritical CO<math>_2</math>. In the drying process, the sample is first put into Isopropanol for at least 1 hour, and then loaded into the machine. When the machine is started, the isopropanol is exchanged for liquid CO<math>_2</math>. When there is only CO<math>_2</math> in the machine, the pressure and temperature in the chamber is raised, above the so called “critical point”. At this point, there is no longer a liquid/gas interfacen, but instead the CO<math>_2</math> is in a supercritical state. Because of this, the problem with surface tension, which destroys the fragile structures through capillary forces, is avoided. | ||
==Equipment performance and process related parameters== | ==Equipment performance and process related parameters== | ||
| Line 42: | Line 46: | ||
*Pieces (up to 10x10mm) | *Pieces (up to 10x10mm) | ||
|- | |- | ||
| style="background:LightGrey; color:black"| | | style="background:LightGrey; color:black"|Materials allowed | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *Please consult the [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=254 Critical Point Dryer cross contamination sheet] | ||
|- | |- | ||
|} | |} | ||
<!-- copyright issue rkc | |||
==Comparison of samples dried in air and with Critical Point Dryer== | ==Comparison of samples dried in air and with Critical Point Dryer== | ||
| Line 143: | Line 138: | ||
An acknowledgment goes to Tom Larsen, Nanoprobes, DTU Nanotech, who provided the pictures. | An acknowledgment goes to Tom Larsen, Nanoprobes, DTU Nanotech, who provided the pictures. | ||
--> | |||