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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning click here]'''  
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'''All measurements on this page has been made by Nanolab staff.'''


== Cleaning of wafers ==
== Cleaning of wafers ==
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===Wafers that go into the high temperature furnaces===
===Wafers that go into the high temperature furnaces===
As a general rule all wafers that go into the high temperature furnaces need a full RCA clean directly before the furnace step.  
As a general rule all wafers that go into the high temperature furnaces need a full RCA clean directly before the furnace step.  
There are, however, some exception to this rule. Please find more information on wafer cleaning before furnace processes [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/Storage_and_cleaning_of_wafer_to_the_A,_B,_C_and_E_stack_furnaces here].
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===Items that have been outside the cleanroom===
===Items that have been outside the cleanroom===
Before bringing samples into the cleanroom you have to get approval from Nanolab, this procedure is described on [[Specific_Process_Knowledge/Wafer_cleaning/Bring_samples_into_cleanroom|Bring samples into cleanroom]]
Before bringing samples into the cleanroom you have to get approval from Nanolab ("Bring samples into cleanroom"-procedure). The approval process and cleaning procedure is described on <b>[[Specific_Process_Knowledge/Wafer_cleaning/Bring_samples_into_cleanroom | here]]</b>. Please note that the approval for bringing samples into the cleanroom is personal (and fellow group members need to send in seperate request).
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===Masks===
===Masks===
Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use.  
Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use. You can find more information [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha here].
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