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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning click here]'''  
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'''All measurements on this page has been made by Nanolab staff.'''


== Cleaning of wafers ==
== Cleaning of wafers ==
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===Wafers that go into the high temperature furnaces===
===Wafers that go into the high temperature furnaces===
As a general rule all wafers that go into the high temperature furnaces need a full RCA clean directly before the furnace step.  
As a general rule all wafers that go into the high temperature furnaces need a full RCA clean directly before the furnace step.  
There are, however, some exception to this rule. Please find more information on wafer cleaning before furnace processes [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/Storage_and_cleaning_of_wafer_to_the_A,_B,_C_and_E_stack_furnaces here].
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===Items that have been outside the cleanroom===
===Items that have been outside the cleanroom===
Before bringing samples into the cleanroom you have to get approval from Nanolab. Send an e-mail to '''[mailto:nanolabsupport@nanolab.dtu.dk?Subject=Request%20to%20bring%20samples%20into%20the%20cleanroom&body=Describe%20your%20samples:%0AWhy%20you%20need%20to%20bring%20them%20in%20the%20cleanroom:%0Aand%20which%20processes%20your%20are%20going%20to%20use:  nanolabsupport@nanolab.dtu.dk]'''.  
Before bringing samples into the cleanroom you have to get approval from Nanolab ("Bring samples into cleanroom"-procedure). The approval process and cleaning procedure is described on <b>[[Specific_Process_Knowledge/Wafer_cleaning/Bring_samples_into_cleanroom | here]]</b>. Please note that the approval for bringing samples into the cleanroom is personal (and fellow group members need to send in seperate request).  
 
When you have an approval the items that have been outside the cleanroom should always be cleaned in soap and ultra sound followed by a 7-up or Piranha clean before entering the cleanroom.  
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===Masks===
===Masks===
Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use.  
Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use. You can find more information [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha here].
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