Specific Process Knowledge/Wafer cleaning: Difference between revisions

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+{{cc-nanolab}}
 '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning click here]'''
 == Cleaning of wafers ==
 __NOTOC__
-During processing it is sometimes mandatory, necessary or just recommended to clean the wafers or the photo lithographic masks. This can be done by different cleaning procedures depending on what the wafers have been exposed to and where they are going to be further processed. In the comparison table below is listed different cleaning procedures available at nanolab.
+During processing it is sometimes mandatory, necessary or just recommended to clean the wafers or the photo lithographic masks. This can be done by different cleaning procedures depending on what the wafers have been exposed to, and where they are going to be further processed. In the comparison table below is listed different cleaning procedures available at nanolab.
 ===Wafers that go into the high temperature furnaces===
 As a general rule all wafers that go into the high temperature furnaces need a full RCA clean directly before the furnace step.
+There are, however, some exception to this rule. Please find more information on wafer cleaning before furnace processes [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/Storage_and_cleaning_of_wafer_to_the_A,_B,_C_and_E_stack_furnaces here].
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 ===Items that have been outside the cleanroom===
-Before bringing samples into the cleanroom you have to get approval from Nanolab. Send an e-mail to '''[mailto:danchipsupport@danchip.dtu.dk?Subject=Request%20for%20bringing%20samples%20into%20the%20cleanroom&body=Describe%20your%20samples:%0AWhy%20you%20need%20to%20bring%20them%20in%20the%20cleanroom:%0Aand%20which%20processes%20your%20are%20going%20to%20use:  danchipsupport@danchip.dtu.dk]'''.
+Before bringing samples into the cleanroom you have to get approval from Nanolab ("Bring samples into cleanroom"-procedure). The approval process and cleaning procedure is described on <b>[[Specific_Process_Knowledge/Wafer_cleaning/Bring_samples_into_cleanroom | here]]</b>. Please note that the approval for bringing samples into the cleanroom is personal (and fellow group members need to send in seperate request).
-When you have an approval the items that have been outside the cleanroom should always be cleaned in soap and ultra sound followed by a 7-up or Piranha clean before entering the cleanroom.
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 ===Masks===
-Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use.
+Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use. You can find more information [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha here].
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