Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
/* Please note: This elaborate cleaning method is only used very rarely. It has turned out that at DTU Danchip an 'RCA clean' prior to bonding (and doing cleaning and bonding very early in the morning with few people and thus lower particle level)... |
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/IMEC click here]''' | |||
'''Please note: This elaborate cleaning method is only used very rarely. It has turned out that at DTU Nanolab an '[http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Wafer_cleaning/RCA RCA clean]' prior to bonding (and do the cleaning and bonding very early in the morning with few people and thus lower particle level in the cleanroom) gives the best results. If you for some reason still prefer to do the IMEC clean described below, please contact DTU Nanolab to make arrangements. We do not have dedicated IMEC equipment which is immediately ready for use. | |||
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===The IMEC process: Cleaning of wafers prior to fusion bonding=== | ===The IMEC process: Cleaning of wafers prior to fusion bonding=== | ||
The IMEC cleaning process is used in circumstances where extraordinary clean wafers are required. It is primarily intended for cleaning wafers prior to fusion bonding. This procedure is based on the IMEC cleaning process: ''M. Meuris et al. "The IMEC clean: A new concept for particle and metal removal on Si surfaces.", Solid state Technology, Vol. 38, Issue 7, pp 109-113, 1995.'' | The IMEC cleaning process is used in circumstances where extraordinary clean wafers are required. It is primarily intended for cleaning wafers prior to fusion bonding. This procedure is based on the IMEC cleaning process with slight modifications by Karen Birkelund.: ''M. Meuris et al. "The IMEC clean: A new concept for particle and metal removal on Si surfaces.", Solid state Technology, Vol. 38, Issue 7, pp 109-113, 1995.'' | ||
'''Information about equipment relevant to this procedure can be found in LabManager:'''<br> | '''Information about equipment relevant to this procedure can be found in LabManager:'''<br> | ||
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Info page for '[http://labmanager | Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=368 Fume hood 01: Acids/bases]'<br> | ||
Info page for '[http://labmanager | Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=369 Fume hood 02: Acids/bases]'<br> | ||
Info page for '[http://labmanager | Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=411 Wet bench 03: Wafer and mask cleaning]'<br> | ||
Info page for '[http://labmanager | Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=413 Wet bench 05: Al etch]'<br> | ||
Info page for '[http://labmanager | Info page for '[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=383 Wafer Cleaning]'<br> | ||
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Temp: 80<sup>o</sup>C<br> | Temp: 80<sup>o</sup>C<br> | ||
Time: 5 min | Time: 5 min | ||
|You can use the 'Mask Clean' bath in Wet Bench 04 (in cleanroom D-3). <b>However, this requires planning at least a couple of days in advance, since the bath is primarily used for other purposes!</b> | |You can use the 'Mask Clean' bath in Wet Bench 04 (in cleanroom D-3). <b>However, this requires planning at least a couple of days in advance, since the bath is primarily used for other purposes!</b> Alternatively use a very clean glass beaker. The recommended procedure is: | ||
*Pour H<sub>2</sub>SO<sub>4</sub> into bath/beaker | *Pour H<sub>2</sub>SO<sub>4</sub> into bath/beaker | ||
*Place wafers in clean carrier (USE this in steps 2-7) | *Place wafers in clean carrier (USE this in steps 2-7) | ||
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Temp: 25<sup>o</sup>C<br> | Temp: 25<sup>o</sup>C<br> | ||
Time: 100 sec | Time: 100 sec | ||
|<b>Make an appointment some days in advance with a | |<b>Make an appointment some days in advance with a Nanolab employee to help you with this step!</b> | ||
*Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch) | *Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch) | ||
*Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood | *Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood | ||
*Ask a | *Ask a Nanolab employee to help you filling the solution into the 'Optional Bath' tank! | ||
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Temp: 80<sup>o</sup>C<br> | Temp: 80<sup>o</sup>C<br> | ||
Time: 20 min<br> | Time: 20 min<br> | ||
|Re-use | |Re-use piranha previously made in step 2 | ||
Makes wafers hydrophilic | Makes wafers hydrophilic | ||