Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
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! | ! | ||
! 1% HF in RCA Bench | ! 1% HF in RCA Bench | ||
! | ! 10% HF in D3 wet bench 5 (Oxide etch 3) | ||
! 1% HF Plastic beaker | ! 1% HF Plastic beaker | ||
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!Size of substrate | !Size of substrate | ||
|2"-6" wafers | |2"-6" wafers | ||
|2"- | |2"- 6" wafers or any that fits in a dedicated holder | ||
|2"- 4" wafers or any that fits in a dedicated holder | |2"- 4" wafers or any that fits in a dedicated holder | ||
|- | |- | ||
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<br clear="all" /> | <br clear="all" /> | ||
== | ==40% HF== | ||
{|border="1" cellspacing="1" cellpadding=" | {|border="1" cellspacing="1" cellpadding="2" style="text-align:left;" | ||
|- | |- | ||
|-style="background:silver; color:black" | |-style="background:silver; color:black" | ||
! | ! | ||
! 40% HF | ! 40% HF in Plastic beaker, only done by Nanolab staff | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Batch size! | !Batch size! | ||
|1 wafer at a time | |1 wafer at a time | ||
|- | |- | ||
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!Size of substrate | !Size of substrate | ||
|Any that fits to a dedicated holder | |Any that fits to a dedicated holder | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Allowed materials | !Allowed materials | ||
|All materials | |All materials | ||
|- | |- | ||