Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch/nBoost04: Difference between revisions
Appearance
Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat..." |
No edit summary |
||
| (3 intermediate revisions by the same user not shown) | |||
| Line 1: | Line 1: | ||
<!--Checked for updates on 30/7-2018 - ok/jmli --> | |||
<!--Page reviewed by jmli 9/8-2022 --> | |||
<!--Checked for updates on 4/4-2025 - ok/jmli --> | |||
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" | {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" | ||
| Line 23: | Line 26: | ||
| Pegasus/jmli | | Pegasus/jmli | ||
| 3 minute TDESC clean + 30 sec barc etch | | 3 minute TDESC clean + 30 sec barc etch | ||
| | | nanolab/jml/nano/nanoboost/nboost04 100 cycles or 13 minutes | ||
| S004436 | | S004436 | ||
| | | | ||