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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cpoly3: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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<!--Checked for updates on 11/2-2019 - ok/jmli -->
<!--Checked for updates on 11/2-2019 - ok/jmli -->
<!--Page reviewed by jmli 9/8-2022  -->
<!--Checked for updates on 4/4-2025 - ok/jmli -->
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
{| border="2" cellpadding="0" cellspacing="0" style="text-align:center;"
|+ '''Process runs'''
|+ '''Process runs'''
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| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean + 45 sec barc etch
| 10 minute TDESC clean + 45 sec barc etch
| danchip/jml/showerhead/Cpoly3, 20 cycles or 2:12 minutes  
| nanolab/jml/showerhead/Cpoly3, 20 cycles or 2:12 minutes  
| S004730
| S004730
| New showerhead  
| New showerhead  
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