Specific Process Knowledge/Wafer cleaning/Cleaning with Soap Sonic: Difference between revisions
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If permission is granted the standard cleaning process for the approved substrates are | If permission is granted the standard cleaning process for the approved substrates are | ||
# | # Triton-X soap cleaning as described below | ||
# 10 min cleaning in a piranha solution (sulphuric acid and hydrogen peroxide) | # 10 min cleaning in a piranha solution (sulphuric acid and hydrogen peroxide) | ||
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== | ==Triton-X soap cleaning== | ||
[[Image:Sonic-clean.jpg|300x300px|thumb|Soap sonic clean placed in the wash bench in the changing room (gowning). ]] | [[Image:Sonic-clean.jpg|300x300px|thumb|Soap sonic clean placed in the wash bench in the changing room (gowning). ]] | ||
The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a nonionic detergent which is metal ion free. This detergent is added to reduce surface tension and thus help removing particles from the samples to be cleaned. | The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a nonionic detergent which is metal ion free. This detergent is added to reduce surface tension and thus help removing particles from the samples to be cleaned. | ||