Specific Process Knowledge/Etch/Etching of Polymer/Polymer Etch by ASE: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Polymer/Polymer_Etch_by_ASE click here]''' | ||
<!--Checked for updates on 10/7-2019 - ok/jmli --> | |||
<!--Page reviewed by jmli 9/8-2022 --> | |||
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= Etching of polymers on the ASE = | = Etching of polymers on the ASE = | ||
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! colspan="2" align="center"| Materials | ! colspan="2" align="center"| Materials | ||
! colspan="8" align="center"| Process parameters | ! colspan="8" align="center"| Process parameters | ||
! rowspan="2" align="center" width="300" | Comments by Kevin Riddell SPTS prior to any tests at | ! rowspan="2" align="center" width="300" | Comments by Kevin Riddell SPTS prior to any tests at Nanolab | ||
|- | |- | ||
| Mask | | Mask | ||
| Etched | | Etched | ||
| O<sub>2</sub> | | O<sub>2</sub> | ||
| CO<sub>2</sub> | | CO<sub>2</sub> (no available anymore) | ||
| SF<sub>6</sub> | | SF<sub>6</sub> | ||
| He/Ar | | He/Ar | ||
| Line 110: | Line 113: | ||
==SU8== | ==SU8== | ||
[[Specific Process Knowledge/Etch/Etching of SU-8|Etching of SU-8]] | |||
==TOPAS== | |||
[[Specific Process Knowledge/Etch/Etching of TOPAS|Etching of Topas]] | |||