Specific Process Knowledge/Etch/Etching of Molybdenum: Difference between revisions

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|-style="background:silver; color:black"
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!
!
![[Specific Process Knowledge/Etch/Wet Molybdæn Etch|Mo wet etch]]
![[Specific Process Knowledge/Etch/Wet Chromium Etch|Mo wet etch]]
![[Specific_Process_Knowledge/Etch/Dry etch]]
! Dry etch


|-
|-

Latest revision as of 15:43, 28 March 2025

Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.

All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.

Feedback to this page: click here


Comparison of Molybdenum Etch Methods

Mo wet etch Dry etch
Generel description Wet etch of Mo using Chrome etch 18 Dry etch of Mo
Etch rate range
  • 120 nm etch after 30 sec (not tested yet)
  • (not tested yet)
Etch profile
  • Isotropic
  • Anisotropic (not tested yet)
Masking material
  • AZ resist as a mask (hard baked at 120C for 120sec) led to an under etch of 2ish µm
  • Not tested yet
Substrate size
  • Any size and number that can go inside the beaker in use
Allowed materials

No restrictions cross contamination wise as long as you use the right beaker and make sure that they are safe to enter in the chemicals

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