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<!--Page reviewed by jmli 1/8-2016  -->
==Etching of Titanium==
==Etching of Titanium==


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<br clear="all" />
<br clear="all" />


==Comparison of Titanium Etch Metodes==
==Comparison of Titanium Etch Methodes==


{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
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|-style="background:silver; color:black"
|-style="background:silver; color:black"
!
!
![[Specific Process Knowledge/Etch/Wet Chromium Etch|Ti wet etch 1]]
![[Specific Process Knowledge/Etch/Wet Titanium Etch|Ti wet etch 1]]
![[Specific Process Knowledge/Etch/Wet Chromium Etch|Ti wet etch 2]]
![[Specific Process Knowledge/Etch/Wet Titanium Etch|Ti wet etch 2]]
![[Specific_Process_Knowledge/Etch/ICP_Metal_Etcher|ICP metal]]
![[Specific_Process_Knowledge/Etch/ICP_Metal_Etcher|ICP metal]]
![[Specific_Process_Knowledge/Etch/IBE&frasl;IBSD Ionfab 300|IBE (Ionfab300+)]]
![[Specific_Process_Knowledge/Etch/IBE&frasl;IBSD Ionfab 300|IBE (Ionfab300+)]]
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Generel description
!Generel description
|BHF:Etch of titanium with or without photoresist mask.
|BHF Etch of titanium with or without photoresist mask.
|Cold RCA1: Etch of titanium (as stripper or with eagle resist).  
|Cold RCA1 mix etch of titanium (as stripper or with eagle resist).  
|Dry plasma etch of Ti
|Dry plasma etch of Ti
|Sputtering of Ti - pure physical etch
|Sputtering of Ti - pure physical etch
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!Etch rate range
!Etch rate range
|
|
*~40-100nm/min
*~?nm/min
|
|
*~?nm/min
*~?nm/min
|
|
*~14 nm/min (depending on features size and etch load)  
*~50-200 nm/min (depending on features size and etch load and recipe settings)  
|  
|  
*~30nm/min (not tested yet)
*~20nm/min
|-
|-


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|
|
*smaller pieces on a carrier wafer
*smaller pieces on a carrier wafer
*<nowiki>#</nowiki>1 100mm wafers (when set up to 100mm wafers)
*<nowiki>#</nowiki>1 100mm wafers (if you place it/bond it on a 150 mm carrier wafer)
*<nowiki>#</nowiki>1 150mm wafers (when set up to 150mm wafers)
*<nowiki>#</nowiki>1 150mm wafers  
|
|
Smaller pieces glued to carrier wafer
Smaller pieces glued to carrier wafer
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|}
|}
Ething of Titanium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP]] using Chlorine chemistry or with [[Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300|IBE]] by sputtering with Ar ions.
==Wet etching of Titanium==
[[Image:Fumehoodetch-chrom2.jpg|300x300px|thumb|Fume hood: positioned in cleanroom 2. <br />Wet Etch of Titanium can take place in this pp tank or in a beaker in this fume hood]]
We have two solutions for wet titanium etching:
 
# BHF
# Cold RCA1
Do it by making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. BHF etching can also take place in the PP-etch bath in the fume hood in cleanroom 2.
===Comparing the two solutions===
{| border="1" cellspacing="0" cellpadding="4"
!
! width="200" | BHF
! width="200" | Cold RCA1
|-
|'''General description'''
| Etch of titanium with or without photoresist mask.
| Etch of titanium (as stripper or with eagle resist).
|-
|'''Chemical solution'''
|HF:NH<sub>4</sub>F 
|NH<sub>3</sub>OH:H<sub>2</sub>O<sub>2</sub>:H<sub>2</sub>O - 1:1:5
|-
|'''Process temperature'''
|Room temperature
|Room temperature
|-
|'''Possible masking materials'''
|
Photoresist (1.5 µm AZ5214E)
|
Eagle resist
|-
|'''Etch rate'''
|
Not known (it bubbles while etching)
|
Not known
|-
|'''Batch size'''
|
1-5 4" in beaker
1-25 wafers at a time in PP-etch bath
|
1-5 4" wafer at a time
|-
|'''Etch bath'''
|Beaker or PP-etch bath in the fume hood in cleanroom 2.
|Beaker
|-
|'''Allowed materials'''
|
No restrictions when used in beaker or PP-etch bath in the fume hood in cleanroom 2.
Make a note on the beaker of which materials have been processed.
|
No restrictions when used in beaker.
Make a note on the beaker of which materials have been processed.
|-
|}
== Dry etching of titanium ==
See the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] page.
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