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Specific Process Knowledge/Etch/Etching of Aluminium: Difference between revisions

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'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''
'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''


'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Aluminium click here]'''
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Aluminium click here]'''
<!--Page reviewed by jmli 1/8-2016  -->
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<!-- Ok, jmli 2020-0120 -->
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*~60-100nm/min
*~60-100nm/min
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*~0.5nm/sec (pure Al)
*~30nm/min (pure Al)
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*~350 nm/min (depending on features size and etch load)  
*~350 nm/min (depending on features size and etch load)