Specific Process Knowledge/Lithography/Coaters/GammaDUV: Difference between revisions
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==Spin coater: Süss stepper== | ==Spin coater: Süss stepper== | ||
[[Image:Gamma_2M.jpg| | [[Image:Gamma_2M.jpg|400px|right|thumb|The SÜSS Spinner-Stepper is placed in F-3]] | ||
This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with the 3 resist lines (DUV42S-6, KRF M230Y, and KRF M35G), as well as a syringe dispense system. | This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with the 3 resist lines (DUV42S-6, KRF M230Y, and KRF M35G), as well as a syringe dispense system. | ||
The user manual, quality control procedures and results, user APVs, and contact information can be found in LabManager: | |||
Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=279 LabManager] | |||
Equipment info in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=279 LabManager] - '''requires login''' | |||
{{:Specific Process Knowledge/Lithography/Resist/DUVresist}} | {{:Specific Process Knowledge/Lithography/Resist/DUVresist}} | ||
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===Equipment performance and process related parameters=== | ===Equipment performance and process related parameters=== | ||
{| border=" | {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | ||
!style="background:silver; color:black;" align="center" width="60"|Purpose | !style="background:silver; color:black;" align="center" width="60"|Purpose | ||
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|- | |- | ||
!style="background:silver; color:black; | !style="background:silver; color:black; width="60"|Resist | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
*BARC DUV42S-6 | *BARC DUV42S-6 | ||
*Positive tone resist KRF M230Y | *Positive tone resist KRF M230Y | ||
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!style="background:silver; color:black;" align="center" width="60"|Performance | !style="background:silver; color:black;" align="center" width="60"|Performance | ||
|style="background:LightGrey; color:black"|Coating thickness | |style="background:LightGrey; color:black"|Coating thickness | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
*BARC DUV42S-6 60-90nm | *BARC DUV42S-6 60-90nm | ||
*Positive tone resist KRF M230Y 300-600nm | *Positive tone resist KRF M230Y 300-600nm | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | ||
|style="background:LightGrey; color:black"|Spin speed | |style="background:LightGrey; color:black"|Spin speed | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
10 - 5000 rpm | 10 - 5000 rpm | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Spin acceleration | |style="background:LightGrey; color:black"|Spin acceleration | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
100 - 10000 rpm/s | 100 - 10000 rpm/s | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Hotplate temperature | |style="background:LightGrey; color:black"|Hotplate temperature | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
*175°C for BARC baking | *175°C for BARC baking | ||
*130°C for positive tone resist soft baking and post exposure baking | *130°C for positive tone resist soft baking and post exposure baking | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
*100 mm wafers | *100 mm wafers | ||
*150 mm wafers | *150 mm wafers | ||
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|- | |- | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
*Any standard cleanroom material | *Any standard cleanroom material | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black" colspan="2"| | ||
1 - 25 | 1 - 25 | ||
|- | |- | ||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||