Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions
No edit summary |
|||
| (2 intermediate revisions by the same user not shown) | |||
| Line 12: | Line 12: | ||
* Exposure: 100 kV (JEOL 9500) | * Exposure: 100 kV (JEOL 9500) | ||
* Development: AR 300-46 for 90 seconds | * Development: AR 300-46 for 90 seconds | ||
* Stopper: | * Stopper: DI for 30 seconds + blow dry with nitrogen | ||