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Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	12:42, 29 April 2011		1,024 × 768 (133 KB)	Jml (talk \| contribs)	Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.
	12:40, 29 April 2011		1,024 × 768 (93 KB)	Jml (talk \| contribs)	Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.

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