Specific Process Knowledge/Thin film deposition/Deposition of Carbon: Difference between revisions

Revision as of 20:45, 20 December 2022 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Deposition of Carbon ← Older edit		Latest revision as of 16:09, 9 January 2025 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits No edit summary
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	*[[/Deposition of C in Sputter-System Lesker\|Deposition of Carbon in Sputter-System (Lesker)]]		*[[/Deposition of C in Sputter-System Lesker\|Deposition of Carbon in Sputter-System (Lesker)]]

			In order to deposit carbon, all other parts of the chamber will be covered with Al foil to prevent cross-contamination.