Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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DIRE01 INITIAL: PDEFBE, SUBDEFBE, CURRENT | DIRE01 INITIAL: PDEFBE, SUBDEFBE, CURRENT | ||
CYCLIC: CURRNT (every 5 minutes without interupting the writing of a field) | CYCLIC: CURRNT (every 5 minutes without interupting the writing of a field) | ||
</pre> | |||
The full list of calibration [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation/Pathlist|paths are available here.]] | |||
== Alignment and global mark detection == | == Alignment and global mark detection == | ||
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[[File:markorientation.jpg|300px]] | [[File:markorientation.jpg|300px]] | ||
note 2: Always add | note 2: Always add 5% to the current in this command to make sure you work well below 200 MHz and thus will not be affected if the current fluctuates above the base current. | ||
== Dose variation == | == Dose variation == | ||