Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions
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= DREM 2kW micro = | = DREM 2kW micro = | ||
{{Template: | {{Template:Peg1Table9Head | ||
|TableHeader=DREM 2kW micro | |TableHeader=DREM 2kW micro | ||
}} | |TableStyle = class="wikitable" | ||
{{Template: | |PaddingStyle=padding:0px; | ||
|ActualPressure= | |||
}} | |||
{{Template:Peg1Table9Row | |||
|RecipeName=DREM 2kW micro | |RecipeName=DREM 2kW micro | ||
|PriorProcessSteps= Pump to base, Clamp Substrate, home platen matching unit, stabilisation | |PriorProcessSteps= Pump to base, Clamp Substrate, home platen matching unit, stabilisation | ||
|PaddingStyle=padding:0px; | |||
|ActualPressure= | |||
|Keywords= | |Keywords= | ||
|PlatenPosition=U |PlatenFrequency=HF |StabilisationTime= |StartCycleEndCycle=D/E | |PlatenPosition=U |PlatenFrequency=HF |StabilisationTime= |StartCycleEndCycle=D/E | ||
| Line 14: | Line 20: | ||
|PressureDepDelay= |PressureDepBoost= |PressureDepMain=100% | |PressureDepDelay= |PressureDepBoost= |PressureDepMain=100% | ||
|PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | |PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | ||
|C4F8DepDelay=0.3@5 |C4F8DepBoost= 0.5@50 |C4F8DepMain=200 | |C4F8DepDelay=0.3@5 |C4F8DepBoost= 0.5@ 50 |C4F8DepMain=200 | ||
|C4F8EtchDelay=0.5@100 |C4F8EtchBoost= |C4F8EtchMain=5 | |C4F8EtchDelay=0.5@ 100 |C4F8EtchBoost= |C4F8EtchMain=5 | ||
|SF6DepDelay=0.3@200 |SF6DepBoost=0.5@200 |SF6DepMain=15 | |SF6DepDelay=0.3@ 200 |SF6DepBoost=0.5@ 200 |SF6DepMain=15 | ||
|SF6EtchDelay=2@15 |SF6EtchBoost=0.3@100 |SF6EtchMain=200 | |SF6EtchDelay=2@ 15 |SF6EtchBoost=0.3@ 100 |SF6EtchMain=200 | ||
|O2Dep= |O2Etch= |ArDep=150 |ArEtch=150 | |O2Dep= |O2Etch= |ArDep=150 |ArEtch=150 | ||
|WCoilDep=2 |WCoilEtch=2 |WPlatenDep=1 | |WCoilDep=2 |WCoilEtch=2 |WPlatenDep=1 | ||
|WPlatenEtchDelay=1@1 |WPlatenEtchBoost=1@100 |WPlatenEtchMain=1 | |WPlatenEtchDelay=1@1 |WPlatenEtchBoost=1@ 100 |WPlatenEtchMain=1 | ||
|WClaritasDep= |WClaritasEtch= | |WClaritasDep= |WClaritasEtch= | ||
|%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | |%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | ||
|%PlatenDepLoad=32.5 |%PlatenDepTune=51.9 |%PlatenEtchLoad=32.5 |%PlatenEtchTune=51.9 | |%PlatenDepLoad=32.5 |%PlatenDepTune=51.9 |%PlatenEtchLoad=32.5 |%PlatenEtchTune=51.9 | ||
|%CLaritasLoad= |%ClaritasTune= |Temperature=''' | |%CLaritasLoad= |%ClaritasTune= |Temperature='''0''' | ||
|Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro | ''' | |Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro | '''8''']] | ||
}} | }} | ||
{{Template: | {{Template:Peg1Table9Row | ||
|RecipeName=DREM 2kW micro | |RecipeName=DREM 2kW micro | ||
|PriorProcessSteps= Pump to base, Clamp Substrate, home platen matching unit, stabilisation | |PriorProcessSteps= Pump to base, Clamp Substrate, home platen matching unit, stabilisation | ||
|PaddingStyle=padding:0px; | |||
|ActualPressure= | |||
|Keywords= | |Keywords= | ||
|PlatenPosition=U |PlatenFrequency=HF |StabilisationTime= |StartCycleEndCycle=D/E | |PlatenPosition=U |PlatenFrequency=HF |StabilisationTime= |StartCycleEndCycle=D/E | ||
| Line 35: | Line 43: | ||
|PressureDepDelay= |PressureDepBoost= |PressureDepMain=100% | |PressureDepDelay= |PressureDepBoost= |PressureDepMain=100% | ||
|PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | |PressureEtchDelay= |PressureEtchBoost= |PressureEtchMain=100% | ||
|C4F8DepDelay=0.3@5 |C4F8DepBoost= 0.5@50 |C4F8DepMain=200 | |C4F8DepDelay=0.3 @5 |C4F8DepBoost= 0.5@ 50 |C4F8DepMain=200 | ||
|C4F8EtchDelay=0.5@100 |C4F8EtchBoost= |C4F8EtchMain=5 | |C4F8EtchDelay=0.5@ 100 |C4F8EtchBoost= |C4F8EtchMain=5 | ||
|SF6DepDelay=0.3@200 |SF6DepBoost=0.5@200 |SF6DepMain=15 | |SF6DepDelay=0.3@ 200 |SF6DepBoost=0.5@ 200 |SF6DepMain=15 | ||
|SF6EtchDelay=2@15 |SF6EtchBoost=0.3@100 |SF6EtchMain=200 | |SF6EtchDelay=2@ 15 |SF6EtchBoost=0.3@ 100 |SF6EtchMain=200 | ||
|O2Dep= |O2Etch= |ArDep=150 |ArEtch=150 | |O2Dep= |O2Etch= |ArDep=150 |ArEtch=150 | ||
|WCoilDep=2 |WCoilEtch=2 |WPlatenDep=1 | |WCoilDep=2 |WCoilEtch=2 |WPlatenDep=1 | ||
|WPlatenEtchDelay=1@1 |WPlatenEtchBoost=1@100 |WPlatenEtchMain=1 | |WPlatenEtchDelay=1@1 |WPlatenEtchBoost=1@ 100 |WPlatenEtchMain=1 | ||
|WClaritasDep= |WClaritasEtch= | |WClaritasDep= |WClaritasEtch= | ||
|%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | |%CoilDepLoad=40 |%CoilDepTune=50 |%CoilEtchLoad=40 |%CoilEtchTune=50 | ||
|%PlatenDepLoad=32.5 |%PlatenDepTune=51.9 |%PlatenEtchLoad=32.5 |%PlatenEtchTune=51.9 | |%PlatenDepLoad=32.5 |%PlatenDepTune=51.9 |%PlatenEtchLoad=32.5 |%PlatenEtchTune=51.9 | ||
|%CLaritasLoad= |%ClaritasTune= |Temperature=''' | |%CLaritasLoad= |%ClaritasTune= |Temperature='''-19''' | ||
|Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro at | |Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro at -19 degrees | '''1''']] | ||
}} | }} | ||
|} | |} | ||