Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions

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= DREM 2kW micro =
= DREM 2kW micro =


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|TableHeader=DREM 2kW micro
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|RecipeName=DREM 2kW micro
|RecipeName=DREM 2kW micro
|PriorProcessSteps=  Pump to base, Clamp Substrate, home platen matching unit, stabilisation
|PriorProcessSteps=  Pump to base, Clamp Substrate, home platen matching unit, stabilisation
|PaddingStyle=padding:0px;
|ActualPressure=
|Keywords=  
|Keywords=  
|PlatenPosition=U          |PlatenFrequency=HF          |StabilisationTime=          |StartCycleEndCycle=D/E
|PlatenPosition=U          |PlatenFrequency=HF          |StabilisationTime=          |StartCycleEndCycle=D/E
Line 14: Line 20:
|PressureDepDelay=          |PressureDepBoost=          |PressureDepMain=100%
|PressureDepDelay=          |PressureDepBoost=          |PressureDepMain=100%
|PressureEtchDelay=        |PressureEtchBoost=          |PressureEtchMain=100%
|PressureEtchDelay=        |PressureEtchBoost=          |PressureEtchMain=100%
|C4F8DepDelay=0.3@5        |C4F8DepBoost= 0.5@50        |C4F8DepMain=200
|C4F8DepDelay=0.3@5        |C4F8DepBoost= 0.5@ 50        |C4F8DepMain=200
|C4F8EtchDelay=0.5@100      |C4F8EtchBoost=              |C4F8EtchMain=5
|C4F8EtchDelay=0.5@ 100      |C4F8EtchBoost=              |C4F8EtchMain=5
|SF6DepDelay=0.3@200        |SF6DepBoost=0.5@200        |SF6DepMain=15
|SF6DepDelay=0.3@ 200        |SF6DepBoost=0.5@ 200        |SF6DepMain=15
|SF6EtchDelay=2@15          |SF6EtchBoost=0.3@100        |SF6EtchMain=200
|SF6EtchDelay=2@ 15          |SF6EtchBoost=0.3@ 100        |SF6EtchMain=200
|O2Dep=                    |O2Etch=                    |ArDep=150                        |ArEtch=150
|O2Dep=                    |O2Etch=                    |ArDep=150                        |ArEtch=150
|WCoilDep=2                |WCoilEtch=2                |WPlatenDep=1  
|WCoilDep=2                |WCoilEtch=2                |WPlatenDep=1  
|WPlatenEtchDelay=1@1      |WPlatenEtchBoost=1@100      |WPlatenEtchMain=1
|WPlatenEtchDelay=1@1      |WPlatenEtchBoost=1@ 100      |WPlatenEtchMain=1
|WClaritasDep=              |WClaritasEtch=       
|WClaritasDep=              |WClaritasEtch=       
|%CoilDepLoad=40            |%CoilDepTune=50            |%CoilEtchLoad=40                  |%CoilEtchTune=50
|%CoilDepLoad=40            |%CoilDepTune=50            |%CoilEtchLoad=40                  |%CoilEtchTune=50
|%PlatenDepLoad=32.5        |%PlatenDepTune=51.9        |%PlatenEtchLoad=32.5              |%PlatenEtchTune=51.9
|%PlatenDepLoad=32.5        |%PlatenDepTune=51.9        |%PlatenEtchLoad=32.5              |%PlatenEtchTune=51.9
|%CLaritasLoad=            |%ClaritasTune=              |Temperature='''-19'''
|%CLaritasLoad=            |%ClaritasTune=              |Temperature='''0'''
|Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro | '''1''']]
|Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro | '''8''']]
}}
}}
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{{Template:Peg1Table9Row
|RecipeName=DREM 2kW micro
|RecipeName=DREM 2kW micro
|PriorProcessSteps=  Pump to base, Clamp Substrate, home platen matching unit, stabilisation
|PriorProcessSteps=  Pump to base, Clamp Substrate, home platen matching unit, stabilisation
|PaddingStyle=padding:0px;
|ActualPressure=
|Keywords=  
|Keywords=  
|PlatenPosition=U          |PlatenFrequency=HF          |StabilisationTime=          |StartCycleEndCycle=D/E
|PlatenPosition=U          |PlatenFrequency=HF          |StabilisationTime=          |StartCycleEndCycle=D/E
Line 35: Line 43:
|PressureDepDelay=          |PressureDepBoost=          |PressureDepMain=100%
|PressureDepDelay=          |PressureDepBoost=          |PressureDepMain=100%
|PressureEtchDelay=        |PressureEtchBoost=          |PressureEtchMain=100%
|PressureEtchDelay=        |PressureEtchBoost=          |PressureEtchMain=100%
|C4F8DepDelay=0.3@5        |C4F8DepBoost= 0.5@50        |C4F8DepMain=200
|C4F8DepDelay=0.3 @5        |C4F8DepBoost= 0.5@ 50        |C4F8DepMain=200
|C4F8EtchDelay=0.5@100      |C4F8EtchBoost=              |C4F8EtchMain=5
|C4F8EtchDelay=0.5@ 100      |C4F8EtchBoost=              |C4F8EtchMain=5
|SF6DepDelay=0.3@200        |SF6DepBoost=0.5@200        |SF6DepMain=15
|SF6DepDelay=0.3@ 200        |SF6DepBoost=0.5@ 200        |SF6DepMain=15
|SF6EtchDelay=2@15          |SF6EtchBoost=0.3@100        |SF6EtchMain=200
|SF6EtchDelay=2@ 15          |SF6EtchBoost=0.3@ 100        |SF6EtchMain=200
|O2Dep=                    |O2Etch=                    |ArDep=150                        |ArEtch=150
|O2Dep=                    |O2Etch=                    |ArDep=150                        |ArEtch=150
|WCoilDep=2                |WCoilEtch=2                |WPlatenDep=1  
|WCoilDep=2                |WCoilEtch=2                |WPlatenDep=1  
|WPlatenEtchDelay=1@1      |WPlatenEtchBoost=1@100      |WPlatenEtchMain=1
|WPlatenEtchDelay=1@1      |WPlatenEtchBoost=1@ 100      |WPlatenEtchMain=1
|WClaritasDep=              |WClaritasEtch=       
|WClaritasDep=              |WClaritasEtch=       
|%CoilDepLoad=40            |%CoilDepTune=50            |%CoilEtchLoad=40                  |%CoilEtchTune=50
|%CoilDepLoad=40            |%CoilDepTune=50            |%CoilEtchLoad=40                  |%CoilEtchTune=50
|%PlatenDepLoad=32.5        |%PlatenDepTune=51.9        |%PlatenEtchLoad=32.5              |%PlatenEtchTune=51.9
|%PlatenDepLoad=32.5        |%PlatenDepTune=51.9        |%PlatenEtchLoad=32.5              |%PlatenEtchTune=51.9
|%CLaritasLoad=            |%ClaritasTune=              |Temperature='''0'''
|%CLaritasLoad=            |%ClaritasTune=              |Temperature='''-19'''
|Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro at 0 degre | '''1''']]
|Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro at -19 degrees | '''1''']]
}}
}}
|}
|}

Latest revision as of 09:20, 20 November 2024

The DREM processes

DREM 2kW micro

DREM 2kW micro
Recipe General Pressure Gases Generators Matching Results
C4F8 SF6 Coil Platen Coil Platen
T S/E Dp D B M D B M D B M Dp Dep L T L T Pressure Runs
H/L Cyc Et D B M D B M D B M Et D B M L T L T Keywords
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 8
0 D/E 1.2 100% 0.3@5 0.5@ 50 200 0.3@ 200 0.5@ 200 15 2 1 40 50 32.5 51.9
HF 3 100% 0.5@ 100 5 2@ 15 0.3@ 100 200 2 1@1 1@ 100 1 40 50 32.5 51.9
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 1
-19 D/E 1.2 100% 0.3 @5 0.5@ 50 200 0.3@ 200 0.5@ 200 15 2 1 40 50 32.5 51.9
HF 3 100% 0.5@ 100 5 2@ 15 0.3@ 100 200 2 1@1 1@ 100 1 40 50 32.5 51.9