Specific Process Knowledge/Etch/Wet Titanium Etch: Difference between revisions
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'''Feedback to this page''': '''[mailto:wetchemistry@ | '''Feedback to this page''': '''[mailto:wetchemistry@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Wet_Titanium_Etch click here]''' | ||
'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.''' | |||
'''All links to Kemibrug (SDS) and Labmanager Including APV requires login.''' | |||
'''All measurements on this page has been made by Nanolab staff.''' | |||
[[Category: Equipment|Etch Wet Titanium]] | [[Category: Equipment|Etch Wet Titanium]] | ||
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==Wet etching of Titanium== | ==Wet etching of Titanium== | ||
[[Image:Fumehood1-2.jpg|300x300px|thumb|Fume hood 01 and 02 in Cleanroom D-3 for working with acids and bases.<br>Wet etching of titanium can be done in beakers with BHF or RCA1 mix in a beaker in one of these fume hoods]] | |||
[[Image:Fumehood1-2.jpg|300x300px|thumb|Fume hood | |||
We have two solutions for wet titanium etching: | We have two solutions for wet titanium etching: | ||
# BHF ( | # BHF (beaker in fumehood) | ||
# Cold RCA1 (fumehood) | # Cold RCA1 (beaker in fumehood) | ||
<br> | <br> | ||
Etching titanium in BHF or RCA1 mix is made by making your own solution in a beaker in either Fumehood 01 or 02 in Cleanroom D-3. You can see the APV [http://labmanager.danchip.dtu.dk/d4Show.php?id=2479&mach=146 here]. | |||
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|'''Link to safety APV and KBA''' | |'''Link to safety APV and KBA''' | ||
|[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see APV here] | |[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see APV here] | ||
[ | [https://kemibrug.dk/Kemikalier?stofnavn=BHF See SDS here (requires Kemibrug login)] | ||
|[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see APV here] | |[http://labmanager.dtu.dk/d4Show.php?id=4748&mach=368 see APV here] | ||
|- | |- | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|'''Chemical solution''' | |'''Chemical solution''' | ||
|HF:NH<sub>4</sub>F | |HF : NH<sub>4</sub>F : NH<sub>4</sub>HF<sub>2</sub> | ||
|H<sub>2</sub>O : NH<sub>4</sub>OH : H<sub>2</sub>O<sub>2</sub> - 5:1:1 | |||
|- | |- | ||
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Not known (it bubbles while etching) | Not known (it bubbles while etching) | ||
| | | | ||
50 nm etches in around 2 min | |||
|- | |- | ||
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!Batch size | !Batch size | ||
| | | | ||
1-5 | 1-5 wafers in beaker | ||
| | | | ||
1-5 | 1-5 wafers in beaker | ||
|- | |- | ||
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!Allowed materials | !Allowed materials | ||
| | | | ||
Practically no restrictions when used in beaker. Make sure to use a plastic beaker, since glass will be attacked by BHF/HF. | |||
Make a note on the beaker of which materials have been processed. | Make a note on the beaker of which materials have been processed. | ||
| | | | ||
Practically no restrictions when used in beaker. | |||
Make a note on the beaker of which materials have been processed. | Make a note on the beaker of which materials have been processed. | ||
|- | |- | ||
|} | |} |
Latest revision as of 11:44, 27 June 2024
Feedback to this page: click here
Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.
All links to Kemibrug (SDS) and Labmanager Including APV requires login.
All measurements on this page has been made by Nanolab staff.
Ething of Titanium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with ICP using Chlorine chemistry or with IBE by sputtering with Ar ions.
Wet etching of Titanium
We have two solutions for wet titanium etching:
- BHF (beaker in fumehood)
- Cold RCA1 (beaker in fumehood)
Etching titanium in BHF or RCA1 mix is made by making your own solution in a beaker in either Fumehood 01 or 02 in Cleanroom D-3. You can see the APV here.
Comparing the two solutions
BHF | Cold RCA1 | |
---|---|---|
General description | Etch of titanium with or without photoresist mask. | Etch of titanium (as stripper or with eagle resist). |
Link to safety APV and KBA | see APV here | see APV here |
Chemical solution | HF : NH4F : NH4HF2 | H2O : NH4OH : H2O2 - 5:1:1 |
Process temperature | Room temperature | Room temperature |
Possible masking materials |
Photoresist (1.5 µm AZ5214E) |
Eagle resist |
Etch rate |
Not known (it bubbles while etching) |
50 nm etches in around 2 min |
Batch size |
1-5 wafers in beaker |
1-5 wafers in beaker |
Size of substrate | Any size and number that can go inside the beaker in use. | Any size and number that can go inside the beaker in use. |
Allowed materials |
Practically no restrictions when used in beaker. Make sure to use a plastic beaker, since glass will be attacked by BHF/HF. Make a note on the beaker of which materials have been processed. |
Practically no restrictions when used in beaker. Make a note on the beaker of which materials have been processed. |