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Specific Process Knowledge/Lithography/EBeamLithography/JEOL 9500 User Guide: Difference between revisions

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Thope (talk | contribs)
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL 9500 User Guide click here]'''
Content and illustration by Thomas Pedersen, DTU Nanolab unless otherwise noted.
[[File:TPE02803.jpg|right|400px]]
[[File:TPE02803.jpg|right|400px]]


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*Only authorized users are allowed to use this machine.  
*Only authorized users are allowed to use this machine.  
*In E-2, all users must keep within the area between the front side of the machine and the table with the pre-aligner setup. Only JEOL staff or DTU Nanolab staff may access the backside of the machine.
*In E-2, all users must keep within the area between the front side of the machine and the table with the pre-aligner setup. Only JEOL staff or DTU Nanolab staff may access the backside of the machine.
*No users, not even authorised users, are allowed to load a substrate into the automatic cassette transfer system.
*No users, not even authorised users, are allowed to load a cassette into the automatic cassette transfer system.
*After your exposure, fully trained users can unload their cassettes from the automatic cassette transfer system and unmount their substrates.
*After your exposure, fully trained users can unload their cassettes from the automatic cassette transfer system and unmount their substrates.
*If you are unable to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Nanolab personel unmount your substrates.
*If you are unable to unmount your substrates before another user requires the cassette, you must accept that either the next user or DTU Nanolab personel unmount your substrates.
*Training can be requested by sending a mail with relevant process flow to training@nanolab.dtu.dk
*Training can be requested by sending a mail with relevant process flow to training@nanolab.dtu.dk
   
   
<br>
==Original JEOL Manual==
The original JEOL manual for the e-beam writer JEOL JBX-9500FS is located on the O-drive: O:\CleanroomDrive\_Equipment\E-beam
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*The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system.
*The spot beam for electron beam writing is generated by a ZrO/W emitter and a four-stage electron beam focusing lens system.
*The maximum frequency of the deflector scanner is 100 MHz, i.e. the minimum beam dwell time is 10 ns.
*The maximum frequency of the deflector scanner is 200 MHz, i.e. the minimum beam dwell time is 5 ns.
*The acceleration voltage is locked at 100 kV.
*The acceleration voltage is locked at 100 kV.
*The e-beam writer can pattern structures with a minimum resolution of 10 nm.
*The e-beam writer can pattern structures with a minimum resolution of 10 nm.
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Operation screen of the automatic cassette transfer system / auto stocker. Photo: Thomas Pedersen.
Operation screen of the automatic cassette transfer system / auto stocker.
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Samples can be loaded into appropriate cassettes on the cassette preparation table. Photo: Thomas Pedersen.
Samples can be loaded into appropriate cassettes on the cassette preparation table.
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Nanolab staff member loading the 4" wafer cassette to the automatic cassette transfer system. Photo: Thomas Pedersen.
Nanolab staff member loading the 4" wafer cassette to the automatic cassette transfer system.
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| colspan="2" style="text-align:center;|
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'''Calibration''' and '''RESTOR''' windows. Image: Thomas Pedersen.
'''Calibration''' and '''RESTOR''' windows.
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Result display of current measurement. Image: Thomas Pedersen.
Result display of current measurement.
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Correct result of '''INITAE''' (left) and '''INITBE''' (right). Image: Thomas Pedersen.
Correct result of '''INITAE''' (left) and '''INITBE''' (right).
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| colspan="1" style="text-align:center;|
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Load the '''daily''' batch command and execute it. Image: Thomas Pedersen.
Load the '''daily''' batch command and execute it.
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| colspan="1" style="text-align:center;|
| colspan="1" style="text-align:center;|
Comparison of two drift measurements. Image: Thomas Pedersen.
Comparison of two drift measurements.
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Parameter window of the '''HEIMAP''' subprogram. Image: Thomas Pedersen.
Parameter window of the '''HEIMAP''' subprogram.
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Acquire the calibration data and then apply the data to save. Image: Thomas Pedersen.
Acquire the calibration data and then apply the data to save.
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| colspan="1" style="text-align:center;|
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'''Expose''' window with .mgn file loaded for exposure. Notice that the '''Progress''' part of the window still shows the previous exposure information. This field will not update until exposure is started. Image: Thomas Pedersen.
'''Expose''' window with .mgn file loaded for exposure. Notice that the '''Progress''' part of the window still shows the previous exposure information. This field will not update until exposure is started.
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<br>
<br>
=Job execution with alignment=
Execution of jobs that require alignment requires a few additional steps compared to the process described above. The additional steps are:
*Optical prealignment of the mounted substrate to determine PQ mark offsets and substrate rotation
*Gain correction to ensure the backscatter detector provides sufficient signal for mark detection using '''AGCRG'''
*Verification of PQ mark detection using '''SETWFR'''
*Verification of chip mark detection using '''CHIPAL''' if chip marks are used
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