Specific Process Knowledge/Lithography/Resist: Difference between revisions
Appearance
No edit summary |
|||
| (37 intermediate revisions by one other user not shown) | |||
| Line 1: | Line 1: | ||
{{cc-nanolab}} | |||
''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist click here]''' | ||
[[Category: Lithography|Resist]] | [[Category: Lithography|Resist]] | ||
{{:Specific Process Knowledge/Lithography/Resist/UserBottles}} | |||
=UV Resist= | =UV Resist= | ||
Standard UV sensitive resists available at DTU Nanolab: | |||
*[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] | |||
*[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]] | |||
*[[Specific_Process_Knowledge/Lithography/nLOF|AZ nLOF 2020]] | |||
*[[Specific_Process_Knowledge/Lithography/4562|AZ 4562]] | |||
*[[Specific_Process_Knowledge/Lithography/SU-8|SU-8]] (2005, 2035, and 2075) | |||
*[[Specific_Process_Knowledge/Lithography/TIspray|TI Spray]] | |||
{{:Specific Process Knowledge/Lithography/Resist/UVresist}} | {{:Specific Process Knowledge/Lithography/Resist/UVresist}} | ||
=DUV Resist= | =DUV Resist= | ||
{{:Specific Process Knowledge/Lithography/Resist/DUVresist}} | |||
=E-beam Resist= | =E-beam Resist= | ||
{{:Specific Process Knowledge/Lithography/Resist/Ebeamresist}} | |||
=Imprint Resist= | =Imprint Resist= | ||
{{:Specific Process Knowledge/Lithography/Resist/NILresist}} | |||