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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/EBeamLithography/Dose Testing click here]'''
Content and illustration by Thomas Pedersen, DTU Nanolab unless otherwise noted.
=Introduction=
=Introduction=
In E-beam lithography it is often necesarry to do a dose test in order to get the required result. In a dose test one will expose critical parts of a pattern with various doses and determine the best dose by SEM analysis of the final pattern. There are several ways to set up a dose test array on the JEOL system, in this section we will describe four different setups, each with their own benefits and drawbacks.
In E-beam lithography it is often necesarry to do a dose test in order to get the required result. In a dose test one will expose critical parts of a pattern with various doses and determine the best dose by SEM analysis of the final pattern. There are several ways to set up a dose test array on the JEOL system, in this section we will describe four different setups, each with their own benefits and drawbacks.
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Example frome ChipPlace definine a 10 x 2 element dose matrix with relative doses from 1 to 2, ready for export to V30. Image: Thomas Pedersen.
Example frome ChipPlace definine a 10 x 2 element dose matrix with relative doses from 1 to 2, ready for export to V30.  
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%Modulation table modding for dose test of PEC'ed V30's, see Labadviser for further information
%Modulation table modding for dose test of PEC'ed V30's, see Labadviser for further information
%https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/Dose_Testing
%https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/Dose_Testing
%THOPE 2023-11-06
%THOPE 2023-11-13


%Input variables for modulation table
%Input variables for modulation table
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