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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=


'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_2  click here]'''


'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/SEM_Supra_2 click here]'''
''This page is written by DTU Nanolab internal''


 
[[image:IMAG0188.jpg|450x450px|right|thumb|The SEM Supra 2 is located in cleanroom C-1. {{photo1}} ]]
 
[[image:LA_SEM_Supra_1.jpg|400x400px|right|thumb|The SEM Supra 1]]


=SEM Supra 2=
=SEM Supra 2=


The SEM Supra 2 a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.
The SEM Supra 2 is a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.


The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.
The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.


This SEM has large chamber volume compared to the other SEMs at Danchip. An 8" wafer can be loaded in the chamber, however the X and Y ranges only provide full view of a 6" wafer.
This SEM has large chamber volume compared to the other SEM's in the cleanroom at DTU Nanolab. An 8" wafer can be loaded in the chamber, however the X and Y ranges only provide full view of a 6" wafer.


All samples must be introduced into the chamber using an airlock. The airlock greatly reduces sample exchange times, and it accepts up to 8" wafer holders.  
All samples must be introduced into the chamber using an airlock. The airlock greatly reduces sample exchange times, and it accepts up to 8" wafer holders.  
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[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=327 SEM Supra 2 info page in LabManager]
[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=327 SEM Supra 2 info page in LabManager]
== Performance information ==
*[[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|SEM comparison page]]
*[[Specific Process Knowledge/Characterization/EDX|Energy Dispersive X-ray analysis (EDX)]]




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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment  
|style="background:WhiteSmoke; color:black"|<b>SEM Supra 2 (Supra 60VP SEM)</b>
|style="background:WhiteSmoke; color:black"|<b>SEM Supra 2 </b>
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Purpose
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Purpose
|style="background:LightGrey; color:black"|Imaging and measurement of
|style="background:LightGrey; color:black"|Imaging and measurement of
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Any sample except bulk insulators such as polymers, glass or quartz wafers
* Conducting samples
* Semi-conducting samples
* Thin (~ 5 µm <) layers of non-conducting materials such as polymers
* Thick polymers, glass or quartz samples
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Location  
!style="background:silver; color:black;" align="center" width="60"|Location  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Cleanroom of DTU Danchip
*Cleanroom of DTU Nanolab
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Performance
!style="background:silver; color:black;" align="center" width="60"|Performance
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*Any standard cleanroom material
*Any standard cleanroom material
|-  
|-  
|}
==Quality control of length measurement ==
{| border="1" cellspacing="2" cellpadding="2" colspan="3"
|bgcolor="#98FB98" |'''Quality Control (QC) for SEM Supra 2'''
|-
|
*[http://labmanager.dtu.dk/d4Show.php?id=3531&mach=327 QC procedure for SEM Supra 2]<br>
*[https://labmanager.dtu.dk/view_binary.php?type=data&mach=327 Newest QC data for SEM Supra 2]<br>
'''QC limits:'''
{| {{table}}
| align="center" valign="top"|
{| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"
! Detector
! Settings
! Magnification
! Measured dimensions
! Calibration limit
! Action limit
|-
|SE2
| EHT 10 kV, WD 10 mm
| 2.500 k
| 70x70 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 10 kV, WD 10 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
|-
|SE2
| EHT 10 kV, WD 10 mm
| 75.000 k
| 2x2 μm
| ± 2 %
| ± 3 %
|-
|SE2
| EHT 5 kV, WD 5 mm
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| VPSE
| EHT 10 kV, WD 10 mm, 17 Pa
| 17.000 k
| 10x10 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 5 kV, WD 5 mm
| 200.000 k
| 1x1 μm
| ± 2 %
| ± 3 %
|-
| InLens
| EHT 10 kV, WD 3 mm
| 1.000.000 k
| (imaging only)
| NA
| NA
|-
|}
|-
|}
|}
|}
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