Specific Process Knowledge/Etch/ICP Metal Etcher/Barc Etch: Difference between revisions

Latest revision as of 16:54, 6 February 2023

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Barc Etch

Etching barc with a CF4 recipe for barc etching is a good idea if you are on the limit of having enough DUV resist mask to reach etch depth you need. Here is an example of a barc etch I have started testing. I have also tried with and O2 descum process for comparison.

Parameter	Barc etch with CF4	Barc etch with O2
Coil power	800W	120w
Platen power	100W	15W
Pressure	3 mTorr	5mTorr
Flow rate CF4	4 sccm
Flow rate H2	20sccm
Flow rate O2		10sccm
T	0 degrees	0 degrees

Parameter	Results with 'Barc etch with CF'	Results with 'Barc etch with O2'
Etch rate in barc	52 nm in 30s [bghe 20150519]	62 nm in 50s [bghe 20150521]
Etch rate in KRF resist	27 nm in 30s [bghe 20150519]	73 nm in 50s [bghe 20150521]
Selectivity KRF:Barc	1:2	1:0.8
Etch 65nm barc	Use 40-45s	Use 55-60s

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 ==Barc Etch==
-Etching barc with a dedicated recipe for barc etching is a good idea if you are on the limit of having enough DUV resist mask to reach etch depth you need. Here is an example of a barc etch I have started testing. I have also tried with and O2 descum process for comparison.
+Etching barc with a CF4 recipe for barc etching is a good idea if you are on the limit of having enough DUV resist mask to reach etch depth you need. Here is an example of a barc etch I have started testing. I have also tried with and O2 descum process for comparison.
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