Jump to content

Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions

← Older edit
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
Rkch (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
284 edits
No edit summary
 
(3 intermediate revisions by 2 users not shown)
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Polymer click here]'''
'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''
<!-- Replace "http://labadviser.danchip.dtu.dk/..." wih the link to the Labadviser page-->
 
'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''
 
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Polymer click here]'''
<!-- Replace "http://labadviser.Nanolab.dtu.dk/..." wih the link to the Labadviser page-->
<!--Page reviewed by jmli 9/8-2022  -->


<br clear="all" />
<br clear="all" />
Line 15: Line 20:


*[[Specific Process Knowledge/Lithography/Strip#Plasma_Asher_2|Plasma asher 2]]
*[[Specific Process Knowledge/Lithography/Strip#Plasma_Asher_2|Plasma asher 2]]
*[[/Etch of Photo Resist using RIE|Etch of Photo Resist using RIE]]




Line 79: Line 82:
**N<sub>2</sub>
**N<sub>2</sub>
|
|
*The different solvents available at Danchip, such as  
*The different solvents available at Nanolab, such as  
**Acetone
**Acetone
**1165 Remover
**1165 Remover
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/Etching_of_Polymer"