| Display title | Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon |
| Default sort key | Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon |
| Page length (in bytes) | 7,845 |
| Namespace ID | 0 |
| Page ID | 258 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 1 |
| Counted as a content page | Yes |
| Number of subpages of this page | 2 (0 redirects; 2 non-redirects) |
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
| Page creator | BGE (talk | contribs) |
| Date of page creation | 13:13, 28 January 2008 |
| Latest editor | Pevo (talk | contribs) |
| Date of latest edit | 13:18, 26 June 2023 |
| Total number of edits | 65 |
| Total number of distinct authors | 9 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
