| Display title | Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide |
| Default sort key | Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide |
| Page length (in bytes) | 9,755 |
| Namespace ID | 0 |
| Page ID | 99 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Counted as a content page | Yes |
| Number of subpages of this page | 9 (0 redirects; 9 non-redirects) |
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
| Page creator | 192.38.87.76 (talk) |
| Date of page creation | 13:36, 29 October 2007 |
| Latest editor | Eves (talk | contribs) |
| Date of latest edit | 15:45, 7 February 2024 |
| Total number of edits | 108 |
| Total number of distinct authors | 13 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
