| Display title | Specific Process Knowledge/Thin film deposition/ALD Picosun R200/HfO2 deposition using ALD |
| Default sort key | Specific Process Knowledge/Thin film deposition/ALD Picosun R200/HfO2 deposition using ALD |
| Page length (in bytes) | 4,089 |
| Namespace ID | 0 |
| Page ID | 3949 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Counted as a content page | Yes |
| Number of subpages of this page | 0 (0 redirects; 0 non-redirects) |
| Edit | Allow all users (infinite) |
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| Page creator | Tanamp (talk | contribs) |
| Date of page creation | 13:02, 15 May 2017 |
| Latest editor | Pevo (talk | contribs) |
| Date of latest edit | 11:54, 19 June 2023 |
| Total number of edits | 36 |
| Total number of distinct authors | 5 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
