| Display title | Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/HfO2 deposition using ALD2 |
| Default sort key | Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/HfO2 deposition using ALD2 |
| Page length (in bytes) | 8,603 |
| Namespace ID | 0 |
| Page ID | 3856 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
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| Counted as a content page | Yes |
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| Edit | Allow all users (infinite) |
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| Page creator | Tanamp (talk | contribs) |
| Date of page creation | 09:36, 13 March 2017 |
| Latest editor | Eves (talk | contribs) |
| Date of latest edit | 17:09, 28 July 2025 |
| Total number of edits | 81 |
| Total number of distinct authors | 5 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
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