| Display title | Specific Process Knowledge/Etch/DRIE-Pegasus/Using OES to monitor etch process |
| Default sort key | Specific Process Knowledge/Etch/DRIE-Pegasus/Using OES to monitor etch process |
| Page length (in bytes) | 3,028 |
| Namespace ID | 0 |
| Page ID | 4047 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Counted as a content page | Yes |
| Number of subpages of this page | 0 (0 redirects; 0 non-redirects) |
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
| Page creator | Bghe (talk | contribs) |
| Date of page creation | 12:39, 26 October 2017 |
| Latest editor | Jmli (talk | contribs) |
| Date of latest edit | 10:21, 9 August 2022 |
| Total number of edits | 4 |
| Total number of distinct authors | 2 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |
