Information for "Specific Process Knowledge/Etch/DRIE-Pegasus/Nanoscale silicon etching with SF6 and O2"
Basic information
| Display title | Specific Process Knowledge/Etch/DRIE-Pegasus/Nanoscale silicon etching with SF6 and O2 |
| Default sort key | Specific Process Knowledge/Etch/DRIE-Pegasus/Nanoscale silicon etching with SF6 and O2 |
| Page length (in bytes) | 3,128 |
| Namespace ID | 0 |
| Page ID | 5242 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Number of subpages of this page | 0 (0 redirects; 0 non-redirects) |
Page protection
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
Edit history
| Page creator | Vthongu (talk | contribs) |
| Date of page creation | 11:30, 11 May 2020 |
| Latest editor | Jmli (talk | contribs) |
| Date of latest edit | 10:36, 9 August 2022 |
| Total number of edits | 2 |
| Total number of distinct authors | 2 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |