Specific Process Knowledge/Thin film deposition/Gadolinium Cerium Oxide: Revision history

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7 February 2024

  • curprev 17:4617:46, 7 February 2024‎ Eves talk contribs‎ 2,254 bytes +1‎ →‎GCO sputtering in Sputter-System Metal-Oxide (PC1)
  • curprev 17:4517:45, 7 February 2024‎ Eves talk contribs‎ 2,253 bytes +2,253‎ Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Gadolinium_Cerium_Oxide click here]''' ''All text by Nanolab staff'' <br clear="all" /> == Deposition of Gadolinium Cerium Oxide == Thin films of Gadolinium Cerium Oxide (Gd<sub>0.2</sub>Ce<sub>0.8</sub>O<sub>2</sub>) can be deposited using RF sputtering. In this process, the ma..."
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