Specific Process Knowledge/Thin film deposition/Deposition of Silicon Carbide: Revision history

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20 December 2022

16 December 2022

15 December 2022

  • curprev 21:4821:48, 15 December 2022‎ Eves talk contribs‎ 525 bytes +525‎ Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin film deposition/Deposition of Silicon Carbide click here]''' <br clear="all" /> == Deposition of Sicicon Carbide == Sicicon Carbide (SiC) can be deposited by RF-sputtering method. So far the process has been tested only using Sputter-System (Lesker): */Deposition of SiC in Sputter-System Les..."
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