Specific Process Knowledge/Thin film deposition/Deposition of Niobium Nitride: Revision history

29 July 2025

• curprev 11:2811:28, 29 July 2025 Eves talk contribs 2,276 bytes −159 →Niobium nitride (NbN)
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25 July 2025

• curprev 19:2619:26, 25 July 2025 Eves talk contribs 969 bytes 0 No edit summary
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• curprev 19:1419:14, 25 July 2025 Eves talk contribs 963 bytes +4 →Deposition of Niobium Nitride
• curprev 19:1319:13, 25 July 2025 Eves talk contribs 959 bytes +959 Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Niobium_Nitride=submit click here]''' == Deposition of Niobium Nitride == Deposition of ScN can only be done by reactive sputtering using Sc target. The only tool for this application is the Cluster-based multi-chamber high vacuum sputtering..."