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Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Roughness of Chromium: Revision history

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23 June 2025

20 June 2025

  • curprev 16:3016:30, 20 June 2025 Mmat talk contribs 2,631 bytes +2,631 Created page with "= Roughness of Cr layers = ''The results and text here is from Katharina Nilson, staff @ Nanolab (then Danchip) (August 2008)'' Cr have been deposited with both E-beam evaporation and sputtering deposition to examine if there are differences in the roughness of the Cr layers. '''Experimental''' Cr depositions have been done directly on unprocessed Si wafers, all depositions has been done in Wordentec (tool decommissioned in 2025). The deposited layers have thereafter..."
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