Specific Process Knowledge/Thin film deposition/Deposition of Carbon: Revision history

20 December 2022

• curprev 20:4520:45, 20 December 2022‎ Eves talk contribs‎ 532 bytes +59‎ →‎Deposition of Carbon
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• curprev 20:0320:03, 20 December 2022‎ Eves talk contribs‎ 243 bytes −10,883‎ Replaced content with "== Deposition of Carbon == Carbon can be deposited by DC-sputtering method. So far the process has been tested only using Sputter-System (Lesker): *Deposition of Carbon in Sputter-System (Lesker)" Tag: Replaced

• curprev 19:5719:57, 20 December 2022‎ Eves talk contribs‎ 11,126 bytes +11,126‎ Created page with "We can deposit Carbon (C) by DC sputtering in Sputter-System (Lesker). A 2-inch target from gun 1 (DC) is used in the process. Since the material is known to possess cross-contamination issues it was decided to cover all other guns with the protection foil. The fabrication and characterization described below were conducted in <b>2022 by Patama Pholprasit and Evgeniy Shkondin, DTU Nanolab</b>. The prepared samples were investigated by the X-ray Reflectivity (XRR), Spect..."