Specific Process Knowledge/Thin film deposition/ALD Picosun R200/HfO2 deposition using ALD: Revision history

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curprev 12:5412:54, 19 June 2023‎ Pevo talk contribs‎ 4,089 bytes +51‎ No edit summary

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curprev 10:5210:52, 24 August 2018‎ Pevo talk contribs‎ 3,804 bytes +4‎ →‎HfO2 deposition at 150 oC

curprev 10:3910:39, 14 May 2018‎ Pevo talk contribs‎ 3,800 bytes +33‎ No edit summary
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curprev 08:4808:48, 2 June 2017‎ Bghe talk contribs‎ 2,671 bytes 0‎ →‎HfO2 standart recipe

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