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Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2/old: Revision history

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5 October 2026

  • curprev 17:4617:46, 5 October 2026 Eves talk contribs 4,172 bytes +4,172 Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD2_(PEALD)/TiN_deposition_using_ALD2 click here]''' ''This page is written by DTU Nanolab internal'' =General information= As already mentioned in the general ALD2 (PEALD) page, oxides and nitrides cannot be deposited at the same time. Since deposition of aluminum nitride requ..."
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