Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/TiN deposition using ALD2: Revision history

19 June 2023

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24 August 2022

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• curprev 14:2414:24, 24 August 2022‎ Pevo talk contribs‎ 4,003 bytes +116‎ →‎General information

25 November 2019

• curprev 20:5820:58, 25 November 2019‎ Jmli talk contribs‎ 3,887 bytes +4‎ →‎Deposition of thermal TiN using TMA and NH3 precursors
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25 September 2017

• curprev 10:2910:29, 25 September 2017‎ Pevo talk contribs‎ 3,878 bytes +66‎ →‎Deposition of thermal TiN using TMA and NH3 precursors
• curprev 10:1610:16, 25 September 2017‎ Pevo talk contribs‎ 3,812 bytes +839‎ →‎TiN with NH3

13 March 2017

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• curprev 10:4210:42, 13 March 2017‎ Tanamp talk contribs‎ 2,879 bytes +94‎ →‎TiN with NH3
• curprev 09:4609:46, 13 March 2017‎ Tanamp talk contribs‎ 2,785 bytes +248‎ No edit summary
• curprev 09:3909:39, 13 March 2017‎ Tanamp talk contribs‎ 2,537 bytes +2,537‎ Created page with "=General information= As already mentioned in the general ALD2 (PEALD) page oxides and nitrides cannot be deposited at the same time. Since the aluminium nitride requires the ..."