Specific Process Knowledge/Thin film deposition/ALD2 (PEALD)/AlN deposition using ALD2: Revision history

19 June 2023

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11 June 2020

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• curprev 15:4915:49, 11 June 2020‎ Eves talk contribs‎ 6,628 bytes +164‎ →‎X-ray photoelectron spectroscopy
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10 June 2020

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• curprev 18:2618:26, 10 June 2020‎ Eves talk contribs‎ 5,782 bytes +516‎ →‎Stoichiometry
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• curprev 13:4613:46, 10 June 2020‎ Eves talk contribs‎ 4,696 bytes 0‎ →‎Thickness distribution and uniformity
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9 June 2020

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• curprev 18:0718:07, 9 June 2020‎ Eves talk contribs‎ 4,278 bytes +290‎ →‎Presence of Oxygen and Carbon
• curprev 18:0318:03, 9 June 2020‎ Eves talk contribs‎ 3,988 bytes 0‎ →‎Deposition of AlN using TMA and NH3 plasma
• curprev 18:0218:02, 9 June 2020‎ Eves talk contribs‎ 3,988 bytes +45‎ →‎Deposition of AlN using TMA and NH3 plasma
• curprev 18:0018:00, 9 June 2020‎ Eves talk contribs‎ 3,943 bytes +183‎ →‎Deposition of AlN using TMA and NH3 plasma
• curprev 17:5617:56, 9 June 2020‎ Eves talk contribs‎ 3,760 bytes −3‎ →‎Thickness distribution and uniformity
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• curprev 17:0817:08, 9 June 2020‎ Eves talk contribs‎ 1,220 bytes +59‎ →‎X-ray photoelectron spectroscopy
• curprev 17:0517:05, 9 June 2020‎ Eves talk contribs‎ 1,161 bytes +85‎ →‎Spectroscopic ellipsometry
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• curprev 15:2115:21, 9 June 2020‎ Eves talk contribs‎ 3,132 bytes +176‎ →‎Result from acceptance test

25 November 2019

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13 March 2017

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3 March 2017

• curprev 13:0313:03, 3 March 2017‎ Bghe talk contribs‎ 4 bytes +4‎ Created page with "hihu"