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Specific Process Knowledge/Lithography/Strip/resistStrip: Revision history

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16 January 2026

12 January 2026

  • curprev 11:2011:20, 12 January 2026 Jehem talk contribs 744 bytes +744 Created page with "=Resist Strip= 400px|thumb|Resist strip bench in D-3 This resist strip is only for wafers without metal and SU-8. There are one Remover 1165 bath for stripping and one IPA bath for rinsing. '''Here are the main rules for resist strip use:''' *Place the wafers in a wafer holder and put them in the first bath for 10 min, this time is depending how much resist you have on the surface. *After the strip rinse your wafers in the IPA bath for 2-3..."
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