Specific Process Knowledge/Lithography/Strip/PlasmaAsher1: Revision history

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9 January 2025

  • curprev 17:1117:11, 9 January 2025‎ Jehem talk contribs‎ 1,338 bytes +1,338‎ Created page with "300x300px|thumb|The Plasma Asher 1 is placed in C-1 The Plasma Asher 1 (TePla 300 auto load model) can be used for the following process: *Photoresist stripping *Descumming *Surface cleaning after storage *Surface cleaning after processes using oil pump or diffusion pump vacuum *Surface cleaning as part of photolithography after wet developing of lacquer structures prior to wet or plasma etching *Stripping of photoresist layers after etching,..."
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