Specific Process Knowledge/Lithography/Resist/Ebeamresist: Revision history

17 February 2023

• curprev 10:1710:17, 17 February 2023‎ Thope talk contribs‎ 6,777 bytes −5‎ →‎Standard E-beam resists and process guidelines

3 February 2023

• curprev 11:0711:07, 3 February 2023‎ Jehem talk contribs‎ 6,782 bytes −10‎ →‎Non-Standard E-beam resists
• curprev 11:0611:06, 3 February 2023‎ Jehem talk contribs‎ 6,792 bytes −13‎ →‎Standard E-beam resists and process guidelines
• curprev 11:0611:06, 3 February 2023‎ Jehem talk contribs‎ 6,805 bytes +2‎ →‎Standard E-beam resists and process guidelines

26 January 2023

• curprev 15:1215:12, 26 January 2023‎ Jehem talk contribs‎ 6,803 bytes +6,803‎ Created page with "== Standard E-beam resists and process guidelines == DTU Nanolab offers a limited number of standard EBL resist for our users. Our standard resist and process guidelines are summarized below. CSAR (AR-P 6200.09) is installed on Spin coater Gamma E-beam & UV for easy spin coating of 2", 4" and 6" substrates. Other substrate sizes or resist have to be used in the Labspin 2/3 coating systems. The standard resist bottles are stored in the chemical cupboard in E-4. {|borde..."