Specific Process Knowledge/Lithography/EBeamLithography/JEOL 9500 User Guide: Revision history

22 April 2024

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14 November 2023

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6 November 2023

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15 August 2023

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25 March 2023

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14 March 2023

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• curprev 11:2811:28, 14 March 2023‎ Thope talk contribs‎ 4,762 bytes +4,762‎ Created page with "= Purpose, location and technical specifications = ==Type and location of machine== The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writing patterns (10 nm - 1 µm) in electron sensitive resists. The JEOL JBX-9500FS was purchased in 2012 and is installed in E-1 and E-2 at DTU Nanolabv. The main console of the e-beam writer is installed in E-2 which is a class 10 (ISO 4) cleanroom with tight temperature..."