Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Revision history

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26 June 2024

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9 October 2023

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  • curprev 11:5611:56, 8 September 2023Thope talk contribs 843 bytes +12 →‎Single spot EBL
  • curprev 11:5411:54, 8 September 2023Thope talk contribs 831 bytes +831 Created page with "This page is under construction. In time we will fill it with relevant process examples and relevant data. =Single spot EBL= Arrays of circular holes can be created by normal area writing of a mask of circular structures. It can however also be done with a single spot approach, where the beam will dwell at each spot for several µs and hence each spot will become a circular structure by local over exposure. You can read more about this method in the linked article. '''..."