Specific Process Knowledge/Lithography/Descum/PlasmaAsher1: Revision history

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11 December 2024

  • curprev 14:0914:09, 11 December 2024‎ Jehem talk contribs‎ 3,087 bytes +3,087‎ Created page with "640px|thumb|right|Descum results plasma asher 1. September 2019 The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=55 LabManager] - '''requires login''' Descum of AZ5214E resist on 50mm silicon wafer. Wafer was placed horisontally in chamber on a 100 mm carier wafer. '''Recipe 1:'''<br> Note: Plasma asher was cold..."
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