Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong: Revision history

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curprev 10:3110:31, 10 February 2023‎ Bghe talk contribs‎ 128,735 bytes +22‎ No edit summary
curprev 10:3110:31, 10 February 2023‎ Bghe talk contribs‎ 128,713 bytes +4‎ →‎With C4F8 and H2 chemistry (tests done by Peixiong Shi, DTU Nanolab)
curprev 10:3010:30, 10 February 2023‎ Bghe talk contribs‎ 128,709 bytes +9‎ →‎With CF4 and H2 chemistry by Peixiong@nanolab
curprev 10:2910:29, 10 February 2023‎ Bghe talk contribs‎ 128,700 bytes +9‎ →‎With C4F8 and H2 chemistry (tests done by Peixiong@nanolab)

curprev 15:0415:04, 18 August 2021‎ Bghe talk contribs‎ 128,691 bytes 0‎ No edit summary

curprev 10:4510:45, 28 January 2019‎ Bghe talk contribs‎ 128,691 bytes +24‎ →‎With CF4 and H2 chemistry
curprev 10:4410:44, 28 January 2019‎ Bghe talk contribs‎ 128,667 bytes +33‎ No edit summary

curprev 14:0314:03, 10 May 2016‎ Bghe talk contribs‎ 128,634 bytes −113‎ →‎THIS PAGE IS UNDER CONSTRUCTION200px

curprev 10:3410:34, 3 May 2016‎ Bghe talk contribs‎ 128,747 bytes +118‎ →‎Part 1
curprev 10:2310:23, 3 May 2016‎ Bghe talk contribs‎ 128,629 bytes +124‎ →‎Part 1
curprev 08:3008:30, 3 May 2016‎ Bghe talk contribs‎ 128,505 bytes +2,472‎ →‎Part 1

curprev 14:3514:35, 2 May 2016‎ Bghe talk contribs‎ 33,636 bytes +33,636‎ Created page with "<html> <head> <meta http-equiv=Content-Type content="text/html; charset=windows-1252"> <meta name=Generator content="Microsoft Word 14 (filtered)"> <style> <!-- /* Font Defi..."

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