Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By BGHE: Revision history

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3 May 2016

  • curprev 11:3711:37, 3 May 2016Bghe talk contribs 1,961 bytes +1,961 Created page with "I tried with two different gas regimes: CF4 and C4F8. I only made a few tests with CF4 since I got a very bad selectivity to the resist mask and I dicided to go for the C4F8 i..."